Chamber

The all new M Series range of platforms are based on our proven MBE system technology offering a very low and stable UHV performance for MBE researchers utilising a conflat flange platform.  The M Series range regardless of size and complexity use the same proven technology whilst offering optimised characteristics depending on research specialisation and budget.  All M Series platforms are controlled using our latest software control platform TITANIUM 10.

All joints are internally welded to reduce to an absolute minimum any outgassing.
Depending on specification the chamber includes a wide array of in-situ analysis ports, such as ellipsometry, RGA and RHEED.  Base ports are confocal as standard allowing a wider variety and number of deposition sources to be employed for best possible thickness uniformity.  The M500-FLEX has been specifically designed to incorporate a multipocket UHV E-beam source, alongside a wide range of primary Kcell and atom sources

 

Applications

  • Semiconductor films
  • Oxides/Nitrides
  • Nanostructured films
  • Chalcogenides
  • Compound semiconductors
  • Ultra-thin films
  • New materials
M250-ORIGIN M500-FLEX M500-CREATOR
Chamber diameter Sample storage 500mm (~20“)
Cryoshroud (optional) LN2 cryo panel (single walled) with phase separator connections (*) LN2 cryo panel (double walled) with phase separator connections (*)
In-situ analysis ports 2 x DN100/63CF (6″/4.5” O.D.) e.g. RHEED
3 x DN40CF (2 ¾” O.D.) QCM, BFM (BEP), RGA
1 x DN63CF (4.5″ O.D.) e.g. Atom Source
2 x DN100CF (6″ O.D.) e.g. RHEED
4 x DN40CF (2 ¾” O.D.) in reflectance
(e.g. Ellipsometry)
3 x DN40CF (2 ¾” O.D.)  QCM, BFM (BEP), RGA
1 x DN63CF (4.5″ O.D.) e.g. Atom Source
2 x DN100CF (6″ O.D.) e.g. RHEED
4 x DN40CF (2 ¾” O.D.) in reflectance
(e.g. Ellipsometry)
3 x DN40CF (2 ¾” O.D.)  QCM, BFM (BEP), RGA
1 x DN63CF (4.5″ O.D.) e.g. Atom Source
Chamber bakeout Heater tapes Full bakeout tent Full bakeout tent
Default pumping arrangement 265 l/s. turbo pump
3.3 cbm/h roughing pump
240 I/s. ion getter pump
Titanium sublimination pump
355 l/s. turbo pump
6.6 cbm/h roughing pump
400 I/s. ion getter pump
Titanium sublimination pump
355 l/s. turbo pump
6.6 cbm/h roughing pump
400 I/s. ion getter pump
Titanium sublimination pump
Ultimate base pressure <5 x 10-10mbar <2 x 10-10mbar <2 x 10-10mbar
Sample storage Sample storage cassette in load-lock for up to 5 samples
Software TITANIUM automation software